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From Processing to Functionality: Engineering Accessible Material States in Cu-Embedded SiO$_x$ Memristive Devices

arXiv · AI, language, vision and robotics · article · Sep 24, 2026 · UTC

Resistive switching in oxide-based devices is widely governed by stochastic defect processes, yet a predictive link between fabrication conditions and functional behavior remains elusive. Here, we establish a multiscale framework connecting plasma-defined deposition conditions to macroscopic device functionality in sputtered SiO$_x$/Cu/SiO$_x$-based systems. By combining large-scale statistical analysis of more than 50,000 experimentally characterized devices with physics-based plasma and atomistic simulations, we show that device behavior does not emerge from deterministic process-to-performa

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First collected: 2026-09-25T06:12:46.948Z. This is not the publication date.